The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 02, 2021

Filed:

Nov. 21, 2019
Applicant:

Fei Company, Hillsboro, OR (US);

Inventors:

Erik Michiel Franken, Eindhoven, NL;

Remco Schoenmakers, Eindhoven, NL;

Bart Jozef Janssen, Eindhoven, NL;

Martin Verheijen, Eindhoven, NL;

Holger Kohr, Eindhoven, NL;

Yuchen Deng, Eindhoven, NL;

Andreas Voigt, Eindhoven, NL;

Assignee:

FEI Company, Hillsboro, OR (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 37/20 (2006.01); H01J 37/22 (2006.01); H01J 37/26 (2006.01);
U.S. Cl.
CPC ...
H01J 37/20 (2013.01); H01J 37/222 (2013.01); H01J 37/26 (2013.01); H01J 2237/20207 (2013.01);
Abstract

The invention relates to a method of imaging a sample, said sample mounted on a sample holder in an electron microscope, the electron microscope comprising an electron source for generating a beam of energetic electrons along an optical axis and optical elements for focusing and deflecting the beam so as to irradiate the sample with a beam of electrons. The sample holder is capable of positioning and tilting the sample with respect to the electron beam. The method comprises the step of acquiring a tilt series of images by irradiating the sample with the beam of electrons, and concurrently changing a position of the sample during acquisition of the images, so that each image is acquired at an associated unique tilt angle and an associated unique position.


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