The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 01, 2020

Filed:

Feb. 25, 2019
Applicant:

Rigaku Corporation, Tokyo, JP;

Inventors:

Kazuhiko Omote, Tokyo, JP;

Takeshi Osakabe, Tokyo, JP;

Tetsuya Ozawa, Tokyo, JP;

Licai Jiang, Rochester Hills, MI (US);

Boris Verman, Bloomfield, MI (US);

Assignee:

RIGAKU CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G21K 1/00 (2006.01); G21K 1/06 (2006.01); G01N 23/201 (2018.01); G21K 1/02 (2006.01); H05G 1/02 (2006.01);
U.S. Cl.
CPC ...
G21K 1/067 (2013.01); G01N 23/201 (2013.01); G21K 1/025 (2013.01); H05G 1/02 (2013.01); G01N 2223/308 (2013.01); G21K 1/062 (2013.01); G21K 2201/061 (2013.01);
Abstract

An X-ray generator includes: a line X-ray source; a multilayer film mirror; and a side-by-side reflecting mirror including two concave mirrors joined together so as to share a join line. A cross section of a reflecting surface of the multilayer film mirror has a parabolic shape, and a focus of the parabolic shape is located at the line X-ray source. Cross sections of reflecting surfaces of the two concave mirrors of the side-by-side reflecting mirror each have a parabolic shape, and each of focuses of the parabolic shapes is located on a side opposite to the multilayer film mirror. An extended line of the join line of the side-by-side reflecting mirror passes through the multilayer film mirror and the line X-ray source as viewed in a plan view.


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