The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 18, 2020

Filed:

Apr. 18, 2016
Applicant:

Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;

Inventors:

Jun-Nan Nian, Tainan, TW;

Jyun-Ru Wu, Tainan, TW;

Shiu-Ko Jangjian, Tainan, TW;

Yu-Ren Peng, Tainan, TW;

Chi-Cheng Hung, Tainan, TW;

Yu-Sheng Wang, Tainan, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C25D 7/12 (2006.01); H01R 4/2433 (2018.01); H02G 3/08 (2006.01); C25D 3/38 (2006.01); C25D 5/16 (2006.01); C25D 7/00 (2006.01); H01R 13/506 (2006.01); H02G 15/06 (2006.01);
U.S. Cl.
CPC ...
H01R 4/2433 (2013.01); C25D 3/38 (2013.01); C25D 5/16 (2013.01); C25D 7/00 (2013.01); C25D 7/123 (2013.01); H01R 13/506 (2013.01); H02G 3/081 (2013.01); H02G 15/06 (2013.01);
Abstract

A method of electroplating a metal into a recessed feature is provided, which includes: contacting a surface of the recessed feature with an electroplating solution comprising metal ions, an accelerator additive, a suppressor additive and a leveler additive, in which the recessed feature has at least two elongated regions and a cross region laterally between the two elongated regions, and a molar concentration ratio of the accelerator additive: the suppressor additive: the leveler additive is (8-15):(1.5-3):(0.5-2); and electroplating the metal to form an electroplating layer in the recessed feature. An electroplating layer in a recessed feature is also provided.


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