The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 04, 2020
Filed:
May. 17, 2019
Nuflare Technology, Inc., Yokohama-shi, JP;
Nuflare Technology America, Inc., Sunnyvale, CA (US);
Atsushi Ando, Tokyo, JP;
Munehiro Ogasawara, Hiratsuka, JP;
Riki Ogawa, Kawasaki, JP;
John Hartley, Stormville, NY (US);
NuFlare Technology, Inc., Yokohama-shi, JP;
NuFlare Technology America, Inc., Sunnyvale, CA (US);
Abstract
A multiple electron beam irradiation apparatus includes an electromagnetic lens configured to refract multiple electron beams incident, an aberration corrector arranged in the magnetic field of the electromagnetic lens and configured to be able to individually apply a bias potential and a deflection potential to each of the multiple electron beams, and an objective lens configured to focus the multiple electron beams, a trajectory of the each of which has been individually corrected by the bias potential and the deflection potential, onto a target object.