The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 09, 2020
Filed:
Jan. 11, 2019
Extreme ultraviolet (euv) radiation source and a method for generating extreme ultraviolet radiation
Taiwan Semiconductor Manufacturing Company Ltd., Hsinchu, TW;
Wei-Chun Yen, Hsinchu, TW;
Chi Yang, Taichung, TW;
Shang-Chieh Chien, New Taipei, TW;
Li-Jui Chen, Hsinchu, TW;
Po-Chung Cheng, Chiayi County, TW;
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD., Hsinchu, TW;
Abstract
The EUV radiation source includes a rotatable EUV source vessel configured to collect fuel debris generated from the collision of fuel droplets and a laser beam. The source vessel includes an inner surface for receiving the fuel debris, an first aperture at one end of the inner surface, and a heater adjacent to the inner surface and configured to generate a heating area on the inner surface in coordination with a rotation speed of the source vessel. The fuel debris is reflowed to the heating area. A method for generating EUV radiation includes collecting fuel debris on an inner surface of a source vessel, rotating the source vessel at a rotation speed, and heating a portion of the source vessel to an elevated temperature to generate a heating area on the inner surface in coordination with the rotation speed. The fuel debris is reflowed to the heating area.