The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 12, 2020

Filed:

May. 24, 2019
Applicant:

Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;

Inventors:

Ming-Chang Wen, Kaohsiung, TW;

Chang-Yun Chang, Taipei, TW;

Hsien-Chin Lin, Hsinchu, TW;

Hung-Kai Chen, Taichung, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); H01L 21/3215 (2006.01); H01L 21/3105 (2006.01); H01L 29/06 (2006.01); H01L 29/66 (2006.01); H01L 29/78 (2006.01); H01L 21/8258 (2006.01); H01L 21/8238 (2006.01); H01L 21/762 (2006.01); H01L 27/11 (2006.01); H01L 27/02 (2006.01);
U.S. Cl.
CPC ...
H01L 21/0214 (2013.01); H01L 21/02164 (2013.01); H01L 21/31056 (2013.01); H01L 21/32155 (2013.01); H01L 21/8258 (2013.01); H01L 21/823814 (2013.01); H01L 29/0649 (2013.01); H01L 29/66545 (2013.01); H01L 29/785 (2013.01); H01L 29/7848 (2013.01); H01L 21/76224 (2013.01); H01L 27/0207 (2013.01); H01L 27/1104 (2013.01);
Abstract

A semiconductor structure includes a substrate; first and second fins extending from the substrate and oriented lengthwise generally along a first direction; an isolation feature over the substrate and separating bottom portions of the first and the second fins; first and second epitaxial semiconductor features over the first and the second fins, respectively; and a first dielectric feature sandwiched between the first and the second epitaxial semiconductor features. A maximum width of the first dielectric feature is smaller than a width of the isolation feature between the first and the second fins along a second direction perpendicular to the first direction.


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