The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 17, 2019

Filed:

Feb. 26, 2018
Applicant:

Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;

Inventors:

Tzung-Hui Lee, New Taipei, TW;

Hung-Jui Kuo, Hsinchu, TW;

Ming-Che Ho, Tainan, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 23/498 (2006.01); H01L 25/11 (2006.01); H01L 23/31 (2006.01); H01L 21/48 (2006.01);
U.S. Cl.
CPC ...
H01L 23/49822 (2013.01); H01L 21/4857 (2013.01); H01L 23/3107 (2013.01); H01L 23/49827 (2013.01); H01L 23/49838 (2013.01); H01L 25/117 (2013.01);
Abstract

A package structure, a RDL structure and a method of forming the same are provided. The package structure includes a die, an encapsulant, a RDL structure, and a connector. The encapsulant is aside the die. The RDL structure is electrically connected to the die. The connector is connected to the die through the RDL structure. The RDL structure includes a dielectric layer, a first RDL and a second RDL. The dielectric layer is on the encapsulant and the die. The first RDL is penetrating through the dielectric layer to connect to the die, the first RDL comprises a first via and a first trace on the first via. The second RDL is on the first RDL. The second RDL comprises a second via and a second trace on the second via. The second via contacts and covers a portion of a top surface and a portion of sidewalls of the first trace.


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