The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 22, 2019
Filed:
Jun. 15, 2018
Asml Netherlands B.v., Veldhoven, NL;
Kaustuve Bhattacharyya, Veldhoven, NL;
Simon Gijsbert Josephus Mathijssen, Rosmalen, NL;
Marc Johannes Noot, Eindhoven, NL;
Arie Jeffrey Den Boef, Waalre, NL;
Mohammadreza Hajiahmadi, Rotterdam, NL;
Farzad Farhadzadeh, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A method including: for a metrology target, having a first biased target structure and a second differently biased target structure, created using a patterning process, obtaining metrology data including signal data for the first target structure versus signal data for the second target structure, the metrology data being obtained for a plurality of different metrology recipes and each metrology recipe specifying a different parameter of measurement; determining a statistic, fitted curve or fitted function through the metrology data for the plurality of different metrology recipes as a reference; and identifying at least two different metrology recipes that have a variation of the collective metrology data of the at least two different metrology recipes from a parameter of the reference that crosses or meets a certain threshold.