The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 15, 2019
Filed:
Jan. 17, 2018
Ebara Corporation, Tokyo, JP;
Ryo Tajima, Tokyo, JP;
Masahiro Hatakeyama, Tokyo, JP;
Kenichi Suematsu, Tokyo, JP;
Kiwamu Tsukamoto, Tokyo, JP;
Kenji Watanabe, Tokyo, JP;
Shoji Yoshikawa, Tokyo, JP;
Shinichi Okada, Tokyo, JP;
Kenji Terao, Tokyo, JP;
EBARA CORPORATION, Tokyo, JP;
Abstract
Provided is a method of adjusting an electron-beam irradiated area in an electron beam irradiation apparatus that deflects an electron beam with a deflector to irradiate an object with the electron beam, the method including: emitting an electron beam while changing an irradiation position on an adjustment plate by controlling the deflector in accordance with an electron beam irradiation recipe, the adjustment plate detecting a current corresponding to the emitted electron beam; acquiring a current value detected from the adjustment plate; forming image data corresponding to the acquired current value; determining whether the electron-beam irradiated area is appropriate based on the formed image data; and updating the electron beam irradiation recipe when the electron-beam irradiated area is determined not to be appropriate.