The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 30, 2019
Filed:
May. 02, 2016
Applicant:
Asm Ip Holding B.v., Almere, NL;
Inventors:
Fu Tang, Phoenix, AZ (US);
Qi Xie, Leuven, BE;
Jan Willem Maes, Wilrijk, BE;
Xiaoqiang Jiang, Phoenix, AZ (US);
Michael Eugene Givens, Scottsdale, AZ (US);
Assignee:
ASM IP Holding B.V., Almere, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); H01L 21/28 (2006.01); H01L 29/66 (2006.01);
U.S. Cl.
CPC ...
H01L 29/66833 (2013.01); H01L 21/0228 (2013.01); H01L 21/02112 (2013.01); H01L 21/02205 (2013.01); H01L 21/28282 (2013.01);
Abstract
A method for forming layers suitable for a V-NAND stack is disclosed. Specifically, the method may include multiple cycles for forming an oxide and a nitride in order to form an oxynitride layer.
Published as:
US2017317194A1; CN107342218A; KR20170124462A; US10367080B2; US2019378916A1; US11101370B2; KR102344085B1; KR20210158842A; KR102419568B1; CN107342218B;