The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 16, 2019

Filed:

Oct. 29, 2013
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Todd J. Egan, Fremont, CA (US);

Edward W. Budiarto, Fremont, CA (US);

Robert O. Miller, Bayville, NY (US);

Abraham Ravid, San Jose, CA (US);

Bridger E. Hoerner, Columbia Falls, MT (US);

Robert W. Batz, Jr., Kalispell, MT (US);

Daniel J. Woodruff, Kalispell, MT (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C25D 7/12 (2006.01); G01B 7/06 (2006.01); C25D 17/00 (2006.01); C25D 17/12 (2006.01); C25D 21/12 (2006.01); G01N 27/20 (2006.01);
U.S. Cl.
CPC ...
G01B 7/105 (2013.01); C25D 17/001 (2013.01); C25D 21/12 (2013.01); G01N 27/20 (2013.01); C25D 7/123 (2013.01); C25D 17/12 (2013.01);
Abstract

An electroplating reactor includes an electro-plating solution in a bath, a ring cathode in the bath and located to contact a workpiece such that only the front side of the workpiece is immersed in the solution, plural anodes immersed in the bath below the ring cathode, and plural anode voltage sources coupled to the plural anodes; plural thickness sensors at spatially separate locations on the back side of the workpiece with feedback control to the anode voltage sources.


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