The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 09, 2019
Filed:
Oct. 13, 2015
Asml Netherlands B.v., Veldhoven, NL;
Theodorus Petrus Maria Cadee, Vlierden, NL;
Johannes Henricus Wilhelmus Jacobs, Eindhoven, NL;
Nicolaas Ten Kate, Almkerk, NL;
Erik Roelof Loopstra, Heeze, NL;
Aschwin Lodewijk Hendricus Johannes Van Meer, Roosendaal, NL;
Jeroen Johannes Sophia Maria Mertens, Duizel, NL;
Christianus Gerardus Maria De Mol, Son en Breugel, NL;
Marcel Johannus Elisabeth Hubertus Muitjens, Nuth, NL;
Antonius Johannus Van Der Net, Tilburg, NL;
Joost Jeroen Ottens, Veldhoven, NL;
Johannes Anna Quaedackers, Nijmegen, NL;
Maria Elisabeth Reuhman-Huisken, Waalre, NL;
Marco Koert Stavenga, Eindhoven, NL;
Patricius Aloysius Jacobus Tinnemans, Hapert, NL;
Martinus Cornelis Maria Verhagen, Valkenswaard, NL;
Jacobus Johannus Leonardus Hendricus Verspay, Thorn, NL;
Frederik Eduard De Jong, Eindhoven, NL;
Koen Goorman, Eindhoven, NL;
Boris Menchtchikov, Eindhoven, NL;
Herman Boom, Eindhoven, NL;
Stoyan Nihtianov, Eindhoven, NL;
Richard Moerman, Son, NL;
Martin Frans Pierre Smeets, Veldhoven, NL;
Bart Leonard Peter Schoondermark, Vught, NL;
Franciscus Johannes Joseph Janssen, Eindhoven, NL;
Michel Riepen, Bergschenhoek, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a substrate temperature control system configured to provide a control signal to control a substrate temperature conditioning system based on a determined temperature; and a parameter control system configured to adjust a lithographic apparatus parameter, that is other than, or in addition to, the control signal, based on temperature information of the substrate and/or substrate table or on a measure derived from the temperature information.