The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 09, 2019
Filed:
Feb. 20, 2018
Nanotronics Imaging, Inc., Cuyahoga Falls, OH (US);
Randolph E. Griffith, Hollister, CA (US);
Jeff Andresen, Gilroy, CA (US);
Scott Pozzi-Loyola, Watsonville, CA (US);
Michael Moskie, San Jose, CA (US);
Steve Scranton, San Martin, CA (US);
Alejandro S. Jaime, Hollister, CA (US);
John B. Putman, Celebration, FL (US);
Nanotronics Imaging, Inc., Cuyahoga Falls, OH (US);
Abstract
Systems, devices, and methods for combined wafer and photomask inspection are provided. In some embodiments, chucks are provided, the chucks comprising: a removable insert, wherein the removable insert is configured to support a wafer so that an examination surface of the wafer lies within a focal range when the chuck is in a first configuration, wherein the removable insert is inserted into the chuck in the first configuration; and a first structure forming a recess that has a depth sufficient to support a photomask so that an examination surface of the photomask lies within the focal range when the chuck is in a second configuration, wherein the removable insert is not inserted into the chuck in the second configuration.