The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 05, 2019
Filed:
Apr. 20, 2016
Varian Semiconductor Equipment Associates, Inc., Gloucester, MA (US);
Costel Biloiu, Rockport, MA (US);
Piotr Lubicki, Peabody, MA (US);
Tyler Rockwell, Wakefield, MA (US);
Christopher Campbell, Newburyport, MA (US);
Vikram Singh, North Andover, MA (US);
Kevin M. Daniels, Lynnfield, MA (US);
Richard J. Hertel, Boxford, MA (US);
Peter F. Kurunczi, Cambridge, MA (US);
Alexandre Likhanskii, Malden, MA (US);
VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC., Gloucester, MA (US);
Abstract
A processing apparatus may include a plasma chamber to house a plasma and having a main body portion comprising an electrical insulator; an extraction plate disposed along an extraction side of the plasma chamber, the extraction plate being electrically conductive and having an extraction aperture; a substrate stage disposed outside of the plasma chamber and adjacent the extraction aperture, the substrate stage being at ground potential; and an RF generator electrically coupled to the extraction plate, the RF generator establishing a positive dc self-bias voltage at the extraction plate with respect to ground potential when the plasma is present in the plasma chamber.