The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 01, 2019

Filed:

Mar. 17, 2017
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Wenyu Zhang, San Jose, CA (US);

Wei V. Tang, Santa Clara, CA (US);

Yixiong Yang, San Jose, CA (US);

Chen-Han Lin, Campbell, CA (US);

Yi Xu, San Jose, CA (US);

Yu Lei, Belmont, CA (US);

Naomi Yoshida, Sunnyvale, CA (US);

Lin Dong, San Jose, CA (US);

Drew Phillips, San Jose, CA (US);

Srividya Natarajan, Saratoga, CA (US);

Atashi Basu, Menlo Park, CA (US);

Kaliappan Muthukumar, Tamilnadu, IN;

David Thompson, San Jose, CA (US);

Paul F. Ma, Santa Clara, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/285 (2006.01); C23C 14/14 (2006.01); C23C 12/00 (2006.01); H01L 29/66 (2006.01); H01L 29/45 (2006.01); H01L 21/28 (2006.01); H01L 29/49 (2006.01);
U.S. Cl.
CPC ...
H01L 21/28556 (2013.01); C23C 12/00 (2013.01); C23C 14/14 (2013.01); H01L 21/28088 (2013.01); H01L 21/28568 (2013.01); H01L 29/456 (2013.01); H01L 29/4966 (2013.01); H01L 29/66795 (2013.01);
Abstract

Described are methods of depositing a titanium aluminum nitride film on a substrate surface with a controlled amount of carbon. The methods include exposing a substrate surface to a titanium precursor, a nitrogen reactant and an aluminum precursor with purges of the unreacted titanium and aluminum precursors and unreacted nitrogen reactants between each exposure.


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