The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 18, 2018

Filed:

Sep. 16, 2015
Applicant:

Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;

Inventors:

Dhanyakumar Mahaveer Sathaiya, Hsinchu, TW;

Kai-Chieh Yang, Zhubei, TW;

Wei-Hao Wu, Hsinchu, TW;

Ken-Ichi Goto, Hsinchu, TW;

Zhiqiang Wu, Chubei, TW;

Yuan-Chen Sun, Hsinchu, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/10 (2006.01); H01L 29/66 (2006.01); H01L 29/78 (2006.01); H01L 29/16 (2006.01); H01L 21/265 (2006.01);
U.S. Cl.
CPC ...
H01L 29/1041 (2013.01); H01L 29/1045 (2013.01); H01L 29/1608 (2013.01); H01L 29/66537 (2013.01); H01L 29/66651 (2013.01); H01L 29/7833 (2013.01); H01L 21/2658 (2013.01); H01L 21/26506 (2013.01); H01L 29/66545 (2013.01);
Abstract

A metal-oxide-semiconductor field-effect transistor (MOSFET) device includes a channel region comprising dopants of a first type. The MOSFET device further includes a gate dielectric over the channel region, and a gate over the gate dielectric. The MOSFET device further includes a source comprising dopants of a second type, and a drain comprising dopants of the second type, wherein the channel region is between the source and the drain. The MOSFET device further includes a deactivated region underneath the gate, wherein dopants within the deactivated region are deactivated.


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