The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 11, 2018

Filed:

Jan. 08, 2016
Applicant:

Taiwan Semiconductor Manufacturing Co., Ltd., Hsin-Chu, TW;

Inventors:

Chen-Hua Yu, Hsinchu, TW;

Shang-Yun Hou, Jubei, TW;

Wen-Chih Chiou, Zhunan Township, TW;

Jui-Pin Hung, Hsinchu, TW;

Der-Chyang Yeh, Hsin-Chu, TW;

Chiung-Han Yeh, Tainan, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/78 (2006.01); H01L 49/02 (2006.01); H01L 27/12 (2006.01); H01L 27/32 (2006.01); H01L 23/00 (2006.01); H01L 23/522 (2006.01); H01L 21/48 (2006.01); H01L 21/56 (2006.01); H01L 25/00 (2006.01); H01L 23/525 (2006.01);
U.S. Cl.
CPC ...
H01L 21/78 (2013.01); H01L 21/4853 (2013.01); H01L 21/565 (2013.01); H01L 23/5223 (2013.01); H01L 24/19 (2013.01); H01L 24/96 (2013.01); H01L 24/97 (2013.01); H01L 25/50 (2013.01); H01L 27/1255 (2013.01); H01L 27/3276 (2013.01); H01L 28/40 (2013.01); H01L 28/60 (2013.01); H01L 23/525 (2013.01); H01L 2224/04105 (2013.01); H01L 2224/12105 (2013.01); H01L 2224/97 (2013.01); H01L 2924/181 (2013.01); H01L 2924/18162 (2013.01); H01L 2924/19041 (2013.01); H01L 2924/19104 (2013.01);
Abstract

A package includes a chip that has a metal-insulator-metal (MIM) capacitor formed in a first polymer layer and a metallic pillar formed on the MIM capacitor. A molding compound surrounds the chip, a second polymer layer is formed on the chip and the molding compound, a third polymer layer is formed on the second polymer layer, an interconnect structure is formed between the second polymer layer and the third polymer layer and electrically coupled to the metallic pillar and the MIM capacitor, and a bump is formed over and electrically coupled to the interconnect structure.


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