The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 20, 2018

Filed:

Aug. 28, 2017
Applicant:

Taiwan Semiconductor Manufacturing Co., Ltd., Hsin-Chu, TW;

Inventors:

Ming Chyi Liu, Hsinchu, TW;

Chen-Hua Yu, Hsinchu, TW;

Chia-Shiung Tsai, Hsin-Chu, TW;

Alexander Kalnitsky, San Francisco, CA (US);

Ru-Liang Lee, Hsinchu, TW;

Eugene Chen, Taipei, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/30 (2006.01); H01L 21/46 (2006.01); H01L 33/00 (2010.01); H01L 21/762 (2006.01); H01L 21/18 (2006.01); H01L 21/285 (2006.01); H01L 21/8258 (2006.01);
U.S. Cl.
CPC ...
H01L 33/0079 (2013.01); H01L 21/185 (2013.01); H01L 21/28575 (2013.01); H01L 21/76251 (2013.01); H01L 21/8258 (2013.01); H01L 33/0095 (2013.01);
Abstract

A method for wafer to wafer bonding for III-V and CMOS wafers is provided. A silicon carrier wafer is provided having an epitaxial III-V semiconductor region and an oxide region disposed over the wafer top surface, the regions having substantially equal heights. A sidewall of the epitaxial III-V semiconductor region directly contacts a sidewall of the oxide region. A eutectic bonding layer is formed over a top surface of the epitaxial III-V semiconductor region and the oxide region for bonding to the CMOS wafer which contains semiconductor devices. The silicon carrier wafer is removed, and the CMOS wafer is singulated to form a plurality of three-dimensional integrated circuits, each including a CMOS substrate corresponding to a portion of the CMOS wafer and a III-V optical device corresponding to a portion of the III-V epitaxial semiconductor region.


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