The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 16, 2018
Filed:
Jan. 12, 2015
Applied Materials, Inc., Santa Clara, CA (US);
Sungwon Ha, Palo Alto, CA (US);
Kwangduk Douglas Lee, Redwood City, CA (US);
Ganesh Balasubramanian, Sunnyvale, CA (US);
Juan Carlos Rocha-Alvarez, San Carlos, CA (US);
Martin Jay Seamons, San Jose, CA (US);
Ziqing Duan, Sunnyvale, CA (US);
Zheng John Ye, Santa Clara, CA (US);
Bok Hoen Kim, San Jose, CA (US);
Lei Jing, Santa Clara, CA (US);
Ngoc Le, Santa Clara, CA (US);
Ndanka Mukuti, Santa Clara, CA (US);
APPLIED MATERIALS, INC., Santa Clara, CA (US);
Abstract
Embodiments described herein relate to a faceplate for improving film uniformity. A semiconductor processing apparatus includes a pedestal, an edge ring and a faceplate having distinct regions with differing hole densities. The faceplate has an inner region and an outer region which surrounds the inner region. The inner region has a greater density of holes formed therethrough when compared to the outer region. The inner region is sized to correspond with a substrate being processed while the outer region is sized to correspond with the edge ring.