Ngoc Le

Title: Ngoc Le - Innovator in Semiconductor Processing Technology

Introduction

Ngoc Le is a notable inventor based in Santa Clara, California, recognized for her contributions to semiconductor processing technology. With a focus on improving film uniformity, she has made significant strides in the field through her innovative designs.

Latest Patents

Ngoc Le holds a patent for an invention titled "Edge Hump Reduction Faceplate by Plasma Modulation." This patent describes a faceplate designed to enhance film uniformity in semiconductor processing. The apparatus includes a pedestal, an edge ring, and a faceplate with distinct regions that have varying hole densities. The inner region of the faceplate features a higher density of holes compared to the outer region, which is tailored to correspond with the edge ring. This innovative design is crucial for optimizing the processing of substrates.

Career Highlights

Ngoc Le is currently employed at Applied Materials, Inc., a leading company in the semiconductor industry. Her work at Applied Materials has allowed her to contribute to advancements in semiconductor processing technologies, making her a valuable asset to the team.

Collaborations

Ngoc Le collaborates with talented colleagues, including Sungwon Ha and Kwangduk Douglas Lee. These partnerships foster an environment of innovation and creativity, further enhancing the development of cutting-edge technologies in their field.

Conclusion

Ngoc Le's contributions to semiconductor processing through her innovative patent and collaborative efforts highlight her role as a key inventor in the industry. Her work continues to influence advancements in technology, showcasing the importance of innovation in semiconductor manufacturing.