The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 14, 2018
Filed:
Mar. 11, 2016
Lam Research Corporation, Fremont, CA (US);
Daniel Arthur Brown, Brentwood, CA (US);
John Patrick Holland, San Jose, CA (US);
Michael C. Kellogg, San Francisco, CA (US);
James E. Tappan, Fremont, CA (US);
Jerrel K. Antolik, Livermore, CA (US);
Ian Kenworthy, Santa Clara, CA (US);
Theo Panagopoulos, San Jose, CA (US);
Zhigang Chen, Campbell, CA (US);
Lam Research Corporation, Fremont, CA (US);
Abstract
A plasma chamber is provided to increase conductance within the plasma chamber and to increase uniformity of the conductance. A radio frequency (RF) path for supplying power to the plasma chamber is symmetric with respect to a center axis of the plasma chamber. Moreover, pumps used to remove materials from the plasma chamber are located symmetric with respect to the center axis. The symmetric arrangements of the RF paths and the pumps facilitate an increase in conductance uniformity within the plasma chamber.