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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10023674 B1

PDFFull Text
Date of Patent:
Jul. 17, 2018

Filed:

Feb. 07, 2017

Monomer, polymer, resist composition, and patterning process

Applicant:

Shin-etsu Chemical Co., Ltd., Tokyo, JP;

Inventors:

Masayoshi Sagehashi, Joetsu, JP;

Masahiro Fukushima, Joetsu, JP;

Koji Hasegawa, Joetsu, JP;

Teppei Adachi, Joetsu, JP;

Kazuhiro Katayama, Joetsu, JP;

Jun Hatakeyama, Joetsu, JP;

Assignee:

SHIN-ETSU CHEMICAL CO., LTD., Tokyo, JP;

Attorney:

Westerman, Hattori, Daniels & Adrian, LLP

Primary Examiner:

Amanda C Walke

Int. Cl.
CPC ...
G03F 7/004 (2006.01); C08F 222/20 (2006.01); C07C 69/675 (2006.01); C08F 220/28 (2006.01); G03F 7/038 (2006.01); G03F 7/16 (2006.01); G03F 7/20 (2006.01); G03F 7/38 (2006.01); G03F 7/32 (2006.01); C08F 220/24 (2006.01); C07C 381/12 (2006.01); C08F 220/18 (2006.01); C08F 220/30 (2006.01);
U.S. Cl.
CPC ...
C08F 222/20 (2013.01); C07C 69/675 (2013.01); C07C 381/12 (2013.01); C08F 220/18 (2013.01); C08F 220/24 (2013.01); C08F 220/28 (2013.01); C08F 220/30 (2013.01); G03F 7/0045 (2013.01); G03F 7/038 (2013.01); G03F 7/162 (2013.01); G03F 7/168 (2013.01); G03F 7/2004 (2013.01); G03F 7/322 (2013.01); G03F 7/38 (2013.01); C07C 2101/14 (2013.01); C07C 2103/74 (2013.01); C08F 2220/283 (2013.01);
Abstract

A monomer having a substituent group capable of polarity switch under the action of acid is provided. A useful polymer is obtained by polymerizing the monomer. A resist composition comprising the polymer has improved development properties and is processed to form a negative pattern having high resolution and etch resistance which is insoluble in alkaline developer.

Find Patent Forward Citations

Sagehashi, Masayoshi. (2018). Monomer, polymer, resist composition, and patterning process (U.S. Patent No. 10023674). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10023674

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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