The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 19, 2018
Filed:
Nov. 20, 2014
Asml Netherlands B.v., Veldhoven, NL;
Youri Johannes Laurentius Maria Van Dommelen, Ballston Lake, NY (US);
Peter David Engblom, Hillsboro, OR (US);
Lambertus Gerardus Maria Kessels, Ballston Lake, NY (US);
Arie Jeffrey Den Boef, Waalre, NL;
Kaustuve Bhattacharyya, Veldhoven, NL;
Paul Christiaan Hinnen, Veldhoven, NL;
Marco Johannes Annemarie Pieters, Eindhoven, NL;
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
A method and apparatus for obtaining focus information relating to a lithographic process. The method includes illuminating a target, the target having alternating first and second structures, wherein the form of the second structures is focus dependent, while the form of the first structures does not have the same focus dependence as that of the second structures, and detecting radiation redirected by the target to obtain for that target an asymmetry measurement representing an overall asymmetry of the target, wherein the asymmetry measurement is indicative of focus of the beam forming the target. An associated mask for forming such a target, and a substrate having such a target.