This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2026.
Company Filing History:
Years Active: 2026
Title: Zx Fan - Innovator in FinFET Technology
Introduction
Zx Fan is a prominent inventor based in Hsinchu, Taiwan. He is known for his contributions to semiconductor technology, particularly in the development of FinFET structures. With a focus on innovation, Zx Fan has made significant strides in enhancing the performance and efficiency of electronic devices.
Latest Patents
Zx Fan holds a patent for a method of forming a FinFET with a long channel length structure. This innovative method involves several steps, including depositing a conductive material across adjacent fins, applying a sacrificial mask, and patterning the conductive material to create segments. The process also includes the deposition of a sacrificial layer and the epitaxial growth of source/drain regions from the semiconductor substrate. This patent showcases Zx Fan's expertise in semiconductor fabrication techniques.
Career Highlights
Zx Fan is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading player in the semiconductor industry. His work at this esteemed company has allowed him to collaborate with other talented professionals in the field.
Collaborations
Some of Zx Fan's notable coworkers include Jung-Chi Jeng and Wen-Yu Kuo. Their collective efforts contribute to advancements in semiconductor technology and innovation.
Conclusion
Zx Fan's contributions to FinFET technology and his innovative patent demonstrate his commitment to advancing the semiconductor industry. His work continues to influence the development of more efficient electronic devices.