This inventor holds 1 USPTO granted patent. Top assignee: Nanchang University. Active years: 2023.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2023
Title: Zuozhi Hu: Innovator in Plasma Measurement Technology
Introduction
Zuozhi Hu is a prominent inventor based in Nanchang, China. He has made significant contributions to the field of plasma measurement technology. His innovative approach has led to the development of a unique method for measuring the ion nonextensive parameter of plasma.
Latest Patents
Zuozhi Hu holds a patent titled "Method for measuring plasma ion nonextensive parameter." This invention describes a method that utilizes nonextensive statistical mechanics to measure the ion nonextensive parameter of plasma. The process involves several steps, including obtaining an equation that relates the geodesic acoustic mode frequency to the ion acoustic speed of plasma. The method also includes collecting measurement data and using it to derive the ion nonextensive parameter numerically. This invention addresses a critical gap in the diagnosis of ion nonextensive parameters, complementing existing methods for measuring electron nonextensive parameters.
Career Highlights
Zuozhi Hu is affiliated with Nanchang University, where he continues to advance research in plasma physics. His work has garnered attention for its innovative approach and practical applications in the field. With 1 patent to his name, he is recognized for his contributions to scientific knowledge and technology.
Collaborations
Zuozhi Hu has collaborated with notable colleagues, including Huibin Qiu and Donghua Xiao. Their joint efforts have furthered research in plasma measurement and related technologies.
Conclusion
Zuozhi Hu's innovative work in measuring plasma ion nonextensive parameters showcases his expertise and commitment to advancing scientific research. His contributions are vital for the ongoing development of plasma measurement technologies.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile