Zumou Wu

Title: **Zumou Wu: Innovator in Phase Shift Mask Technology**

Introduction

Zumou Wu, an esteemed inventor based in Beijing, China, has made significant contributions to the field of electronic component manufacturing. With a total of 8 patents to his name, his work primarily focuses on advancements in phase shift mask technology, which plays a critical role in the production of electronic displays.

Latest Patents

Among Zumou Wu's most recent patents is a groundbreaking invention related to phase shift masks and electronic component manufacturing methods. This patent describes a phase shift mask incorporating a transparent substrate and strategically designed light-shielding portions. The innovative design includes a first light-shielding portion alongside a first compensating light-shielding portion, optimizing exposure during electron-beam lithography. Another recent patent focuses on a method for fabricating an array substrate used in display apparatuses, which demonstrates the application of Wu's phase shift masks in creating efficient display panels.

Career Highlights

Zumou Wu has notably worked with prominent companies in the technology sector, including Beijing BOE Display Technology Co., Ltd. and BOE Technology Group Co., Ltd. His role in these organizations has allowed him to not only develop innovative technologies but also stay at the forefront of advancements in display technologies.

Collaborations

In his journey as an inventor, Zumou Wu has collaborated with talented individuals such as Xiaolong Li and Mingxuan Liu. These partnerships have contributed significantly to the innovative efforts within the companies he has worked for and the development of his patented technologies.

Conclusion

Zumou Wu exemplifies the spirit of innovation in the field of electronic components, particularly through his work on phase shift masks. With multiple patents to his name, he continues to push the boundaries of technology, ensuring that his contributions will make a lasting impact on the industry.