Salem, NH, United States of America

Zualfquar Mohammed

This inventor holds 1 USPTO granted patent. Top assignee: Analog Devices,inc.. Active years: 2013.


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2013

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1 patent (USPTO):Explore Patents

Title: Zualfquar Mohammed: Innovator in Variable Pattern Technology

Introduction

Zualfquar Mohammed is a notable inventor based in Salem, NH (US). He has made significant contributions to the field of technology, particularly in the area of pattern formation. His innovative approach has led to the development of a unique method that enhances the precision of variable patterns across wafers.

Latest Patents

Zualfquar holds 1 patent for his invention titled "Method of forming variable patterns using a reticle." This method involves creating a plurality of first patterns on a wafer, which are repeated across the surface. Each first pattern contains a first readable element. Additionally, the method includes the formation of second patterns, which are also repeated and contain second readable elements. The alignment of these patterns is carefully managed to create corresponding variable patterns, showcasing Zualfquar's innovative thinking in the field.

Career Highlights

Zualfquar Mohammed is currently employed at Analog Devices, Inc., where he continues to push the boundaries of technology. His work has been instrumental in advancing methods of pattern formation, which are crucial in various applications within the semiconductor industry.

Collaborations

Zualfquar has collaborated with esteemed colleagues such as Lee James Jacobson and Francis J McNally. These partnerships have fostered an environment of innovation and creativity, contributing to the success of their projects.

Conclusion

Zualfquar Mohammed's contributions to the field of technology through his innovative patent demonstrate his expertise and commitment to advancing the industry. His work continues to inspire future innovations in pattern formation.

Profile summary based on public USPTO records.
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