The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 01, 2013
Filed:
Oct. 16, 2008
Lee J. Jacobson, Cape Elizabeth, ME (US);
Francis J. Mcnally, Melrose, MA (US);
Zualfquar Mohammed, Salem, NH (US);
Robert Maher, Newton, MA (US);
Lee J. Jacobson, Cape Elizabeth, ME (US);
Francis J. McNally, Melrose, MA (US);
Zualfquar Mohammed, Salem, NH (US);
Robert Maher, Newton, MA (US);
Analog Devices, Inc., Norwood, MA (US);
Abstract
A method of forming a variable pattern across a wafer using a reticle forms a plurality of first patterns on the wafer. The first pattern is repeated across the wafer and each first pattern has a first readable element. The method also forms a plurality of second patterns on the wafer. The second patterns is repeated across the wafer and each second pattern has a second readable element. The second patterns are positioned relative to the first patterns by aligning a first second pattern relative to one portion of a corresponding first pattern and then incrementally misaligning each successive second pattern in a row or a column relative to its corresponding first pattern. Thus, each corresponding first readable element and second readable element form a corresponding variable pattern.