Company Filing History:
Years Active: 2024
Title: Zu-Yin Liu: Innovator in Semiconductor Technology
Introduction
Zu-Yin Liu is a notable inventor based in Taipei City, Taiwan. He has made significant contributions to the field of semiconductor technology. Although he currently holds no granted patents, his innovative work continues to push the boundaries of this critical industry.
Latest Patent Applications
Zu-Yin Liu's latest patent application is titled "SEMICONDUCTOR FIN CUT PROCESS AND STRUCTURES FORMED THEREBY." This method involves forming a fin that protrudes from a substrate. The fin includes an epitaxial stack over a fin base and a hard mask layer over the epitaxial stack. The epitaxial stack consists of first and second semiconductor layers with different material compositions. The process includes a first etching process to etch the hard mask layer, utilizing a first combination of etchants. Following this, a second etching process is performed to etch the epitaxial stack, applying a second combination of etchants. Finally, a third etching process is conducted to etch the fin base, using a third combination of etchants. Notably, the first, second, and third combinations of etchants are distinct from one another.
Conclusion
Zu-Yin Liu's work in semiconductor technology showcases his innovative approach to complex processes. His latest patent application reflects his commitment to advancing the field. As he continues to develop new methods, his contributions may lead to significant advancements in semiconductor manufacturing.