Zohreh Hesabi

Title: Zohreh Hesabi: Innovator in Plasma Etching Technology

Introduction

Zohreh Hesabi is a prominent inventor based in San Jose, California, known for her significant contributions to the field of plasma etching technology. With a total of seven patents to her name, she has made remarkable advancements in methods for removing metal-containing layers from substrates.

Latest Patents

One of her latest patents focuses on methods of etching metal-containing layers, specifically tungsten. This innovative method involves generating a first plasma in a plasma chamber when a patterned device is placed on a substrate support. The device consists of a patterned region and an unpatterned region, along with a tungsten-containing layer formed over the substrate. The process includes depositing a first film over the patterned region and removing portions of the unpatterned region of the tungsten-containing layer using the first plasma, all while ensuring that the unpatterned region does not receive the first film.

Career Highlights

Zohreh Hesabi has established herself as a key figure in her field through her work at Applied Materials, Inc. Her expertise in plasma technology has led to numerous innovations that enhance manufacturing processes in the semiconductor industry.

Collaborations

Throughout her career, Zohreh has collaborated with notable colleagues, including Akhil Mehrotra and Gene S. Lee. These partnerships have fostered a creative environment that encourages the development of cutting-edge technologies.

Conclusion

Zohreh Hesabi's contributions to plasma etching technology and her innovative methods for removing metal-containing layers have positioned her as a leading inventor in her field. Her work continues to influence advancements in semiconductor manufacturing processes.