Zizhou Gong

Title: Zizhou Gong: Innovator in Charged-Particle Beam Technology

Introduction

Zizhou Gong is a prominent inventor based in San Jose, California. He has made significant contributions to the field of charged-particle beam technology. His innovative work has led to the development of advanced imaging systems that enhance the capabilities of electron beam apparatuses.

Latest Patents

Zizhou Gong holds a patent for a "Multiple charged-particle beam apparatus with low crosstalk." This patent describes systems and methods for forming images of a sample using a multi-beam apparatus. The method includes generating multiple secondary electron beams from various probe spots on the sample when interacting with primary electron beams. It also involves adjusting the orientation of these primary beams, directing the secondary beams away from them, compensating for astigmatism aberrations, and focusing the beams onto a detection plane.

Career Highlights

Zizhou Gong is currently employed at ASML Netherlands B.V., a leading company in the semiconductor industry. His work at ASML focuses on enhancing imaging technologies that are crucial for the development of advanced microchips. His innovative approaches have positioned him as a key player in the field.

Collaborations

Zizhou Gong has collaborated with notable colleagues, including Weiming Ren and Xuerang Hu. These collaborations have fostered a productive environment for innovation and have contributed to the advancement of their shared projects.

Conclusion

Zizhou Gong's contributions to charged-particle beam technology exemplify the impact of innovation in the semiconductor industry. His patent and work at ASML highlight his role as a leading inventor in this field.