Ann Arbor, MI, United States of America

Ziyun Li

This inventor holds 1 USPTO granted patent. Top assignee: University of Michigan. Active years: 2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ziyun Li. Retrieved from https://idiyas.com/inventor/ziyun-li-u91z475h

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2019

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Ziyun Li: Innovator in Optical Flow Measurement

Introduction

Ziyun Li is a prominent inventor based in Ann Arbor, MI (US). He has made significant contributions to the field of optical flow measurement, showcasing his innovative approach to image processing.

Latest Patents

Ziyun Li holds a patent for an advanced method of optical flow measurement. This patent describes a technique where optical flow is measured between a first image and a second image by evaluating a match quantifying parameter in respect of a set of candidate flow vectors. The method involves selecting flow vectors based on neighboring pixels that have previously calculated match quantifying parameters. Additionally, the technique incorporates adjacent flow vectors corresponding to target pixels and includes randomly selected flow vectors to enhance the accuracy of the measurement.

Career Highlights

Ziyun Li is affiliated with the University of Michigan, where he continues to engage in research and development in the field of optical flow and image processing. His work has garnered attention for its innovative methodologies and practical applications.

Collaborations

Ziyun Li collaborates with Hun-Seok Kim, contributing to advancements in their shared field of expertise.

Conclusion

Ziyun Li's contributions to optical flow measurement exemplify the innovative spirit of modern inventors. His work not only enhances the understanding of image processing but also paves the way for future advancements in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…