Company Filing History:
1 out of 128 
1 out of 135 Years Active: 1997-2010
Title: Ziyuan Liu: Innovator in Semiconductor Technology
Introduction
Ziyuan Liu is a notable inventor based in Kawasaki, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work focuses on innovative methods that enhance the manufacturing and analysis of semiconductor materials.
Latest Patents
One of Liu's latest patents is a method of manufacturing an insulating film containing hafnium. This invention involves a stacked film with an insulating layer of hafnium formed above a silicon layer and a polysilicon layer. The stacked film is then heated in an atmosphere containing oxygen and nitrogen, with the total pressure approximately equal to the partial pressure of nitrogen.
Another significant patent is for a method for identifying surface atoms of a solid sample and the corresponding apparatus. This method involves forming island-like deposits on the surface of a solid sample, which can generate fluorescent X-rays when energized by an electron beam. The emitted fluorescent X-rays are then analyzed to determine the atoms constituting the surface of the sample.
Career Highlights
Throughout his career, Ziyuan Liu has worked with prominent organizations such as the International Superconductivity Technology Center and the Semiconductor Technology Academic Research Center. His experience in these institutions has allowed him to develop and refine his innovative techniques in semiconductor technology.
Collaborations
Liu has collaborated with notable colleagues, including Tadataka Morishita and Masaharu Oshima. These partnerships have contributed to the advancement of research and development in their respective fields.
Conclusion
Ziyuan Liu's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor. His innovative methods continue to impact the industry and pave the way for future advancements.