The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 23, 2010
Filed:
Jun. 26, 2008
Masaharu Oshima, Tokyo, JP;
Haruhiko Takahashi, Tokyo, JP;
Koji Usuda, Yokohama, JP;
Ziyuan Liu, Kawasaki, JP;
Liu Guo-lin, Higashiyamato, JP;
Kazuto Ikeda, Ome, JP;
Masaki Yoshimaru, Hachioji, JP;
Masaharu Oshima, Tokyo, JP;
Haruhiko Takahashi, Tokyo, JP;
Koji Usuda, Yokohama, JP;
Ziyuan Liu, Kawasaki, JP;
Liu Guo-lin, Higashiyamato, JP;
Kazuto Ikeda, Ome, JP;
Masaki Yoshimaru, Hachioji, JP;
Semiconductor Technology Academic Research Center, Yokohama-shi, JP;
Abstract
A stacked film has an insulating film containing hafnium formed above a silicon layer and a polysilicon layer formed on the insulating film. The stacked film is heated in an atmosphere containing oxygen and nitrogen and having the total pressure approximately equal to a partial pressure of the nitrogen.