Zhouyi Luo

Title: Innovations of Zhouyi Luo in MIS Capacitor Technology

Introduction

Zhouyi Luo is an accomplished inventor based in Shanghai, China. He has made significant contributions to the field of semiconductor technology, particularly in the development of Metal-Insulator-Semiconductor (MIS) capacitors. His innovative approach has led to the creation of a unique capacitor design that enhances performance and efficiency.

Latest Patents

Zhouyi Luo holds a patent for a MIS capacitor and the method of making it. The patent describes a MIS capacitor that includes a semiconductor substrate with a first part having a first conductivity type and contact regions for coupling the first part to an output node. The substrate features dielectric on the surface of the first part and electrodes on the dielectric. Additionally, the substrate has a second part with a second conductivity type and a third part with the first conductivity type. The design incorporates p-n junctions and reference contacts for improved functionality. This innovative capacitor design is aimed at enhancing the performance of electronic devices.

Career Highlights

Zhouyi Luo is currently employed at NXP B.V., a leading company in semiconductor solutions. His work at NXP B.V. has allowed him to collaborate with other talented professionals in the field. His contributions to the company and the industry have been recognized for their impact on technology.

Collaborations

Zhouyi has worked alongside notable colleagues such as Chao Chen and Feng Cong. Their collaborative efforts have contributed to advancements in semiconductor technology and innovation.

Conclusion

Zhouyi Luo's work in the development of MIS capacitors showcases his innovative spirit and dedication to advancing technology. His patent reflects a significant step forward in semiconductor design, and his contributions continue to influence the industry.