Beijing, China

Zhoumiao Shi

This inventor holds 1 USPTO granted patent. Top assignee: National Institute of Metrology, China. Active years: 2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Zhoumiao Shi. Retrieved from https://idiyas.com/inventor/zhoumiao-shi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2023

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1 patent (USPTO):Explore Patents

Title: Zhoumiao Shi: Innovator in Surface Texture Measurement Technology

Introduction

Zhoumiao Shi is a prominent inventor based in Beijing, China. He has made significant contributions to the field of surface texture measurement technology. His innovative work has led to the development of a unique patent that enhances the precision of surface texture analysis.

Latest Patents

Zhoumiao Shi holds a patent for a "Surface texture probe and measurement apparatus with a vibrational membrane." This invention includes a housing, a vibrational membrane, a stylus holder, a vertical guide assembly, a guide adjustment assembly, and a stylus. The design allows for improved measurement accuracy by utilizing a vibrational membrane that facilitates precise movement and adjustment of the stylus.

Career Highlights

Zhoumiao Shi is affiliated with the National Institute of Metrology, China. His work at this esteemed institution has positioned him as a key figure in the advancement of metrology and measurement technologies. His dedication to innovation is evident in his patent and ongoing research efforts.

Collaborations

Zhoumiao Shi collaborates with talented colleagues, including Shu Zhang and Yushu Shi. Their combined expertise contributes to the development of cutting-edge measurement technologies.

Conclusion

Zhoumiao Shi's contributions to surface texture measurement technology exemplify the spirit of innovation. His patent and work at the National Institute of Metrology highlight his commitment to advancing the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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