Zhonghui Alex Wang

Title: Innovations by Zhonghui Alex Wang

Introduction

Zhonghui Alex Wang is a notable inventor based in San Jose, California. He has made significant contributions to the field of semiconductor technology, particularly in the cleaning processes of semiconductor wafers. With a total of 2 patents, his work has had a substantial impact on the industry.

Latest Patents

Wang's latest patents focus on thermal methods for cleaning post-CMP (Chemical Mechanical Polishing) wafers. These methods provide innovative solutions for cleaning semiconductor wafers following the CMP process. An exemplary method involves exposing a wafer to a thermal treatment in an oxidizing environment, which effectively removes residues and oxidizes exposed copper surfaces to form a cupric oxide layer. Following this, a thermal treatment in a reducing environment reduces the cupric oxide back to elemental copper. This process leaves the exposed copper clean and ready for further processing, such as electroless plating.

Career Highlights

Zhonghui Alex Wang is currently employed at Lam Research Corporation, a leading company in the semiconductor equipment industry. His work at Lam Research has allowed him to develop and refine his innovative cleaning methods, contributing to the advancement of semiconductor manufacturing technologies.

Collaborations

Wang has collaborated with several esteemed colleagues, including Fritz C Redeker and Yezdi N Dordi. These collaborations have fostered a productive environment for innovation and have led to the successful development of his patented technologies.

Conclusion

Zhonghui Alex Wang's contributions to semiconductor technology through his innovative cleaning methods have positioned him as a key figure in the industry. His patents reflect a commitment to enhancing the efficiency and effectiveness of semiconductor manufacturing processes.