Company Filing History:
Years Active: 2015-2016
Title: Innovations of Zhonghua Hu
Introduction
Zhonghua Hu is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of optical systems, particularly in lithography technology. With a total of 2 patents, his work has advanced the capabilities of optical performance in various applications.
Latest Patents
Zhonghua Hu's latest patents include two notable inventions. The first is a "Lithography pupil shaping optical system and method for generating off-axis illumination mode." This invention comprises an illumination mode generation unit, a rotatable wave plate, a polarization beam splitter unit, and two ring generation units. By selecting the appropriate diffractive optical element and making necessary adjustments, this system can produce various illumination modes, including single and double ring illumination modes. The intensity at the pupil plane, as well as the inner and outer diameters of the off-axis illumination mode, can be continuously adjusted.
The second patent is for a "Device and method for detecting optical performance of beam shaping element." This detection apparatus is designed for testing the optical performance of beam shaping elements used in ultraviolet lithography machines. It includes a visible wavelength laser and several optical units arranged along the optical axis. The apparatus is characterized by its low cost, ease of operation, and quick measurement capabilities, making it suitable for detecting optical performance across any ultraviolet band.
Career Highlights
Zhonghua Hu is affiliated with the Chinese Academy of Sciences, where he conducts his research and development work. His innovative contributions have positioned him as a key figure in the field of optical engineering.
Collaborations
Zhonghua Hu collaborates with various professionals in his field, including his coworker Huijie Huang. Their joint efforts contribute to the advancement of optical technologies and innovations.
Conclusion
Zhonghua Hu's work exemplifies the importance of innovation in optical systems, particularly in lithography technology. His patents reflect a commitment to enhancing optical performance and efficiency in various applications.