The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 26, 2016
Filed:
Apr. 28, 2013
Shanghai Institute of Optics and Fine Mechanics Chinese Academy of Sciences, Shanghai, CN;
Fang Zhang, Shanghai, CN;
Jing Zhu, Shanghai, CN;
Huijie Huang, Shanghai, CN;
Qiang Song, Shanghai, CN;
Baoxi Yang, Shanghai, CN;
Ming Chen, Shanghai, CN;
Aijun Zeng, Shanghai, CN;
Lihua Huang, Shanghai, CN;
Zhonghua Hu, Shanghai, CN;
Yanfen Xiao, Shanghai, CN;
Abstract
A lithography pupil shaping optical system and method for generating off-axis illumination mode. The invention is composed of illumination mode generation unit, rotatable wave plate, polarization beam splitter unit, ring I generation unit and ring II generation unit. Through selecting corresponding diffractive optical element and appropriate adjustment, this invention can generate various illumination modes including single ring illumination mode and double ring illumination mode. The intensity at pupil plane and the inner and outer diameters of the off-axis illumination mode can be adjusted continuously.