This inventor holds 1 USPTO granted patent. Top assignee: National Tsing Hua University. Active years: 2013.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2013
Title: Innovations of Zhong-Da Tian in Material Layer Stacking
Introduction
Zhong-Da Tian is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of material science, particularly in the fabrication methods for stacking multiple material layers. His innovative approach addresses common challenges in the industry, making it easier to create multi-layer devices.
Latest Patents
Zhong-Da Tian holds a patent for a "Self alignment and assembly fabrication method for stacking multiple material layers." This invention relates to a method that allows various homogeneous and heterogeneous materials to be stacked on a substrate without the need for epitaxial buffer layers or gradient buffer layers. The materials can be in single crystal, polycrystalline, or non-crystalline phases. This method not only reduces material costs but also resolves the wafer alignment issues prevalent in conventional wafer bonding processes. Additionally, the use of rapid melting growth (RMG) facilitates the lateral and rapid growth of crystallized materials from the substrate surface, significantly lowering the thermal budget required for fabricating multi-layer devices.
Career Highlights
Zhong-Da Tian is affiliated with National Tsing Hua University, where he continues to advance research in material sciences. His work has garnered attention for its practical applications and innovative solutions to existing problems in the field.
Collaborations
Zhong-Da Tian has collaborated with esteemed colleagues such as Chih-Kuo Tseng and Ming-Chang Lee. Their joint efforts contribute to the advancement of technology in material layer fabrication.
Conclusion
Zhong-Da Tian's contributions to the field of material science, particularly through his patented methods, showcase his innovative spirit and dedication to solving complex challenges in technology. His work continues to influence the development of multi-layer devices, paving the way for future advancements.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile