IDiyas

For the Inventor, By the Inventor

Singapore, Singapore

Zhixin Xu

USPTO Granted Patents = 4 

Average Co-Inventor Count = 4.5

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:

goldMedal4 out of 37,905 
 
Micron Technology Incorporated
 patents

Years Active: 2019-2025

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4 patents (USPTO):
1. 12250818 - Methods of forming charge-blocking material, and integrated assemblies having charge-blocking material (2025-03-11),
2. 11271006 - Methods of forming charge-blocking material, and integrated assemblies having charge-blocking material (2022-03-08),
3. 10749041 - Programmable charge storage transistor, an array of elevationally-extending strings of memory cells, methods of forming Si3Nx, methods of forming insulator material that is between a control gate and charge-storage material of a programmable charge-storage transistor, methods of forming an array of elevationally-extending strings of memory cells, a programmable charge-storage transistor manufactured in accordance with methods, and an array of elevationally-extending strings of memory cells man (2020-08-18),
4. 10483407 - Methods of forming sin, methods of forming insulator material between a control gate and charge-storage material of a programmable charge-storage transistor, and methods of forming an array of elevationally-extending strings of memory cells and a programmable charge-storage transistor manufactured in accordance with methods (2019-11-19),

Title: Zhixin Xu: Innovator in Charge-Blocking Materials

Introduction

Zhixin Xu is a prominent inventor based in Singapore, known for his contributions to the field of charge-blocking materials. With a total of four patents to his name, Xu has made significant advancements in the development of integrated assemblies that utilize these materials.

Latest Patents

Among his latest patents, Xu has developed methods for forming charge-blocking material and integrated assemblies that incorporate this technology. His innovative approach includes forming a first stack of alternating tiers over a conductive structure, creating openings that are lined with specialized materials. These materials are then converted into charge-blocking substances, which play a crucial role in the functionality of the assemblies. The process also involves the formation of sacrificial materials and the careful removal of these components to ensure the integrity of the charge-storage, dielectric, and channel materials adjacent to the charge-blocking materials.

Career Highlights

Xu is currently employed at Micron Technology Incorporated, where he continues to push the boundaries of technology in his field. His work has not only contributed to the advancement of charge-blocking materials but has also positioned him as a key figure in the industry.

Collaborations

Throughout his career, Xu has collaborated with notable colleagues such as Fei Wang and Kunal Shrotri. These partnerships have fostered an environment of innovation and have led to the successful development of new technologies.

Conclusion

Zhixin Xu's work in the field of charge-blocking materials exemplifies the spirit of innovation and collaboration in technology. His contributions continue to impact the industry positively, showcasing the importance of research and development in advancing modern technology.

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