Zhiwei Xiang

Title: Zhiwei Xiang: Innovator in Display Technology

Introduction

Zhiwei Xiang is a prominent inventor based in Beijing, China. He has made significant contributions to the field of display technology, particularly through his innovative patents. His work focuses on enhancing the performance and efficiency of display apparatuses.

Latest Patents

Zhiwei Xiang holds a patent for an array substrate and display apparatus. This patent describes an array substrate that includes a first semiconductor material layer and a second semiconductor material layer positioned away from a base substrate. The first semiconductor material layer contains active layers for both the driving transistor and the data write transistor. The second semiconductor material layer includes an active layer for the compensating transistor. Notably, the design features a first capacitance formed between a gate connecting pad and either the second semiconductor material layer or a first node connecting line, with the first capacitance being greater than the second capacitance formed between the first node connecting line and a respective second gate line.

Career Highlights

Throughout his career, Zhiwei Xiang has worked with notable companies in the display technology sector. He has been associated with Chengdu BOE Optoelectronics Technology Co., Ltd. and BOE Technology Group Co., Ltd. These experiences have allowed him to develop and refine his expertise in the field.

Collaborations

Zhiwei has collaborated with talented individuals such as Mengmeng Du and Yao Huang. These partnerships have contributed to his innovative projects and advancements in display technology.

Conclusion

Zhiwei Xiang is a key figure in the realm of display technology, with a focus on developing advanced array substrates. His contributions through patents and collaborations highlight his commitment to innovation in this field.