This inventor holds 2 USPTO granted patents. Top assignee: Texas Instruments Corporation. Active years: 2003-2012.
Company Filing History:
Years Active: 2003-2012
Title: Zhiliu Ma: Innovator in Lithographic Technology
Introduction
Zhiliu Ma is a notable inventor based in Plano, TX (US), recognized for his contributions to lithographic technology. He holds 2 patents that showcase his innovative approach to enhancing semiconductor manufacturing processes.
Latest Patents
One of his latest patents is titled "Monitor for variation of critical dimensions (CDs) of reticles." This invention provides a reticle for use in a lithographic process, which includes a patterned layer over a reticle substrate. The reticle also features a test pattern that indicates variances in the patterned layer, thereby improving the accuracy of lithographic processes. Another significant patent is the "Attenuated rim phase shift mask." This mask has a unique pattern that is transferred to a layer overlying a semiconductor wafer. It includes a transmissive portion that allows energy to pass through, a non-transmissive portion, and a semi-transmissive portion that alters the phase of the energy passing through it, enhancing the precision of semiconductor fabrication.
Career Highlights
Zhiliu Ma is currently employed at Texas Instruments Corporation, where he applies his expertise in semiconductor technology. His work has significantly impacted the efficiency and effectiveness of lithographic processes in the industry.
Collaborations
He has collaborated with notable coworkers, including Anthony Yen and Cesar M Garza, contributing to advancements in their field through teamwork and shared expertise.
Conclusion
Zhiliu Ma's innovative patents and contributions to lithographic technology underscore his role as a key figure in the semiconductor industry. His work continues to influence the development of more efficient manufacturing processes.