The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 12, 2012
Filed:
Jul. 30, 2003
Applicants:
Hyesook Hong, Richardson, TX (US);
Zhiliu MA, Plano, TX (US);
John K. Wright, Allen, TX (US);
Inventors:
Assignee:
Texas Instruments Incorporated, Dallas, TX (US);
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/66 (2006.01); G01N 21/00 (2006.01); G03F 1/00 (2012.01); G21K 5/10 (2006.01);
U.S. Cl.
CPC ...
Abstract
The present invention provides a reticlefor use in a lithographic process. The reticle, in one embodiment, includes a patterned layerlocated over a reticle substrate. The reticlemay further include a test patternlocated over the reticle substrate, wherein a portion of the test patternis within a step-distance of a portion of the patterned layer. In this embodiment, a variance in the test pattern is indicative of a variance in the patterned layer.
Hong, Hyesook. (2012). Monitor for variation of critical dimensions (cds) of reticles (U.S. Patent No. 8198105). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8198105
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile