Zhejiang, China

Zhijiang Mao

This inventor holds 1 USPTO granted patent. Top assignee: Hangzhou Everfine Photo-E-Info Co., Ltd.. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Zhijiang Mao. Retrieved from https://idiyas.com/inventor/zhijiang-mao

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Zhijiang Mao: Innovator in Photometric Measurement Systems

Introduction

Zhijiang Mao is a notable inventor based in Zhejiang, China. He has made significant contributions to the field of photometric measurement systems. His innovative work has led to the development of a unique method and system for measuring spectral response.

Latest Patents

Zhijiang Mao holds a patent for an "Integrating sphere photometer spectral response measurement method and system." This system includes an integrating sphere photometer and three or more reference light sources with different peak wavelengths. The integrating sphere photometer features a broadband photodetector mounted on the sphere wall. The system captures the total spectral radiation flux and reads the response of the photometer using the broadband photodetector. Through numerical solutions, the spectral responsivity of the integrating sphere photometer is obtained.

Career Highlights

Zhijiang Mao is associated with Hangzhou Everfine Photo-E-Info Co., Ltd., where he continues to advance his research and development efforts. His work has been instrumental in enhancing the accuracy and efficiency of photometric measurements.

Collaborations

Zhijiang has collaborated with notable colleagues, including Jiangen Pan and Qian Li. Their combined expertise has contributed to the success of various projects within their field.

Conclusion

Zhijiang Mao's innovative contributions to photometric measurement systems exemplify the importance of research and development in advancing technology. His work continues to influence the industry and inspire future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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