Company Filing History:
Years Active: 2012-2014
Title: Innovations of Zhihua Hao in Semiconductor Technology
Introduction
Zhihua Hao is a prominent inventor based in Beijing, China. He has made significant contributions to the field of semiconductor technology, particularly in the development of field effect transistors and fabrication methods. With a total of three patents to his name, Hao's work is recognized for its innovative approaches and practical applications.
Latest Patents
Hao's latest patents include a field effect transistor with a vertical channel and a method for fabricating a semiconductor nano circular ring. The field effect transistor features a circular ring-shaped silicon platform that effectively suppresses the short channel effect, thereby improving device performance. The fabrication method utilizes a positive photoresist and a circular mask to create a nano-sized circular ring structure, significantly reducing fabrication costs.
Career Highlights
Zhihua Hao is affiliated with Peking University, where he continues to advance research in semiconductor technologies. His work has garnered attention for its potential to enhance the performance of electronic devices.
Collaborations
Hao collaborates with notable colleagues, including Ru Huang and Shuangshuang Pu, who contribute to his research endeavors.
Conclusion
Zhihua Hao's innovative patents and research at Peking University highlight his significant role in advancing semiconductor technology. His contributions are paving the way for future developments in the field.