Beijing, China

Zhihao Ren

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Beijing Naura Microelectronics Equipment Co., Ltd.. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Zhihao Ren. Retrieved from https://idiyas.com/inventor/zhihao-ren-c6z44ydb

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 8.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Zhihao Ren: Innovator in Semiconductor Process Technology

Introduction

Zhihao Ren is a prominent inventor based in Beijing, China. He has made significant contributions to the field of semiconductor technology, particularly through his innovative approaches to water supply control in semiconductor process devices.

Latest Patents

Zhihao Ren holds a patent for a "Water replenishment control method for semiconductor process device and semiconductor process device." This patent outlines a water supply control method that includes obtaining water supply time period information for multiple furnace tubes, updating a reservation queue, and managing the state of a liquid evaporator to ensure efficient water supply to the furnace tubes.

Career Highlights

Zhihao Ren is associated with Beijing Naura Microelectronics Equipment Co., Ltd., where he applies his expertise in semiconductor processes. His work focuses on enhancing the efficiency and reliability of semiconductor manufacturing processes.

Collaborations

Zhihao collaborates with notable colleagues, including Kaiyue Cao and Fei Gao, who contribute to the innovative environment at their company.

Conclusion

Zhihao Ren's contributions to semiconductor technology through his patented methods demonstrate his commitment to innovation in the field. His work continues to influence advancements in semiconductor manufacturing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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