Company Filing History:
Years Active: 2023-2025
Title: Innovations by Zhi-Hao Huang
Introduction
Zhi-Hao Huang is a notable inventor based in Hsin-Chu, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, particularly in the area of wafer uniformity control. With a total of three patents to his name, Huang's work has advanced the technology used in plasma-based processes.
Latest Patents
Huang's latest patents include innovative devices and methods for controlling wafer uniformity. One of his patents, titled "Baffle plate for controlling wafer uniformity and methods for making the same," discloses a device that includes a housing defining a process chamber and a baffle plate arranged above a wafer. This baffle plate is designed to control plasma distribution on the wafer, featuring an annular shape with distinct inner radii for its sectors. Another patent focuses on devices and methods for controlling wafer uniformity in plasma-based processes, detailing a gas distribution plate (GDP) that effectively distributes process gas within the chamber.
Career Highlights
Zhi-Hao Huang is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work at TSMC has positioned him as a key player in the development of advanced manufacturing techniques. His patents reflect his commitment to enhancing the efficiency and effectiveness of semiconductor processes.
Collaborations
Throughout his career, Huang has collaborated with esteemed colleagues, including Jr
Inventor’s Patent Attorneys refers to legal professionals with specialized expertise in representing inventors throughout the patent process. These attorneys assist inventors in navigating the complexities of patent law, including filing patent applications, conducting patent searches, and protecting intellectual property rights. They play a crucial role in helping inventors secure patents for their innovative creations.