This inventor holds 1 USPTO granted patent. Top assignee: Other. Active years: 2020.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2020
Title: Zhi-Guang Chen: Innovator in Automated Masking Systems
Introduction
Zhi-Guang Chen is a prominent inventor based in Shenzhen, China. He has made significant contributions to the field of automated systems, particularly in the area of masking technologies. His innovative approach has led to the development of a unique patent that enhances the efficiency of substrate processing.
Latest Patents
Zhi-Guang Chen holds a patent for "Masking and de-masking systems and processes." This automated masking system includes a substrate loading apparatus designed to hold a plurality of substrates. It features a first masking material application station that automatically applies a first masking material to a portion of the substrate. Additionally, there is a second masking material application station that applies a second masking material, which is different from the first. The system incorporates a first and second dispensing apparatus that move relative to the substrate in a repeatable motion. The substrate moves automatically from the first masking material application station to the second, streamlining the masking process.
Career Highlights
Throughout his career, Zhi-Guang Chen has demonstrated a commitment to innovation and excellence in his field. His work has not only advanced technology but has also contributed to the efficiency of manufacturing processes. His patent reflects his expertise and dedication to improving automated systems.
Collaborations
Zhi-Guang Chen has worked alongside talented individuals such as Robert Askin and Joshua Su. Their collaborative efforts have fostered an environment of creativity and innovation, leading to advancements in their respective fields.
Conclusion
Zhi-Guang Chen is a notable inventor whose work in automated masking systems has made a significant impact on substrate processing technologies. His contributions continue to influence the industry and inspire future innovations.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile