The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 29, 2020

Filed:

Jul. 07, 2017
Applicant:

Hzo, Inc., Draper, UT (US);

Inventors:

Robert Askin, Salt Lake City, UT (US);

Joshua Su, Draper, UT (US);

Melon Yu, Shenzhen, CN;

Alex Anderson, Draper, UT (US);

Wei Li, Shenzhen, CN;

Wan-Man Liu, Shenzhen, CN;

Zhi-Guang Chen, Shenzhen, CN;

Assignee:

Other;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B32B 37/00 (2006.01); H05K 13/04 (2006.01); H05K 3/00 (2006.01); B05C 5/00 (2006.01); B05C 9/06 (2006.01); B05C 13/00 (2006.01); B32B 7/12 (2006.01); B32B 37/02 (2006.01);
U.S. Cl.
CPC ...
B32B 37/0046 (2013.01); B05C 5/00 (2013.01); B05C 9/06 (2013.01); B05C 13/00 (2013.01); B32B 7/12 (2013.01); B32B 37/02 (2013.01); H05K 3/0079 (2013.01); H05K 13/0469 (2013.01); B32B 2457/00 (2013.01);
Abstract

An automated masking system includes a substrate loading apparatus designed to hold a plurality of substrates, a first masking material application station designed to automatically apply a first masking material to a portion of the substrate, and a second masking material application station designed to automatically apply a second masking material to a portion of the substrate, the second masking material being different than the first masking material. The system includes a first dispensing apparatus and a second dispensing apparatus that move relative to the substrate in a repeatable motion. The substrate moves automatically from the first masking material application station to the second masking material application station.


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